GaAs metal-oxide-semiconductor capacitors using atomic layer deposition of HfO 2 gate dielectric: Fabrication and characterization
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S. Banerjee | S. Bank | D. Shahrjerdi | E. Tutuc | J. Lee | D. Garcia-Gutierrez | T. Akyol
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S. Banerjee | S. Bank | D. Shahrjerdi | E. Tutuc | J. Lee | D. Garcia-Gutierrez | T. Akyol