Interdiffusion in Pd/Ti Bilayer Films Studied by Auger Electron Depth Profiling

Interdiffusion processes in Pd/Ti bilayer films subjected to diffusion annealing at temperatures between 523 K and 623 K are studied. Changes of the concentration profile with annealing as revealed by Auger electron depth profiling are analyzed based on an error function analysis and the Boltzmann-Matano method to derive the intrinsic diffusion coefficients of Pd and Ti in the films. The diffusion coefficients obtained by the two methods agree well on the Ti-rich side. The temperature dependence of the diffusion coefficients is expressible by an Arrhenius-type equation, from which characteristic diffusion parameters are determined. A structural change associated with the interdiffusion is studied by grazing incidence X-ray diffraction.