Influence of carrier gas pressure and flow rate on atomic layer deposition of HfO2 and ZrO2 thin films
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Jaan Aarik | Aarne Kasikov | Hugo Mändar | Väino Sammelselg | J. Aarik | A. Aidla | V. Sammelselg | H. Mändar | A. Kasikov | Aleks Aidla | Raul Rammula | R. Rammula
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