Interface segregating fluoralkyl-modified polymers for high-fidelity block copolymer nanoimprint lithography.
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Vincent S. D. Voet | D. F. Ogletree | Sang-Min Park | B. Helms | Teresa E. Pick | J. Urban | D. Olynick | A. Hammack | V. Voet | M. Moritz | Sang-min Park | Theresa E. Pick | Deirdre L Olynick