Degradation pattern of thin HfO2 films on Si(100) under ultrahigh-vacuum annealing: An investigation by x-ray photoelectron spectroscopy and low-energy ion scattering
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M. Fanciulli | A. Zenkevich | Y. Lebedinskii | V. Nevolin | V. Kulikauskas | G. Scarel | N. S. Barantsev