Extension of the PC version of VEPFIT with input and output routines running under Windows
暂无分享,去创建一个
The fitting program VEPFIT has been extended with applications running under the Microsoft-Windows environment facilitating the input and output of the VEPFIT fitting module. We have exploited the Microsoft-Windows graphical users interface by making use of dialog windows, scrollbars, command buttons, etc. The user communicates with the program simply by clicking and dragging with the mouse pointing device. Keyboard actions are limited to a minimum. Upon changing one or more input parameters the results of the modeling of the S-parameter and Ps fractions versus positron implantation energy are updated and displayed. This action can be considered as the first step in the fitting procedure upon which the user can decide to further adapt the input parameters or to forward these parameters as initial values to the fitting routine. The modeling step has proven to be helpful for designing positron beam experiments.
[1] H. Schut,et al. Positron beam defect profiling of silicon epitaxial layers , 1991 .
[2] A. C. Kruseman,et al. VEPFIT applied to depth profiling problems , 1995 .
[3] T. C. Leung,et al. Point defects in Si thin films grown by molecular beam epitaxy , 1992 .
[4] Lynn,et al. Defects and impurities at the Si/Si(100) interface studied with monoenergetic positrons. , 1988, Physical review letters.