论文信息 - Evaluating the performance of a 193-nm hyper-NA immersion scanner using scatterometry

Evaluating the performance of a 193-nm hyper-NA immersion scanner using scatterometry

Scatterometry techniques are used to characterize the CD uniformity, focus and dose control, as well as the image contrast of a hyper-NA immersion lithography scanner. Results indicate very good scanner control and stability of these parameters, as well as good precision and sensitivity of the metrology techniques.

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