Ion beam figuring (IBF) is an optical fabrication technique that provides highly deterministic process to correct surface figure error of previously polished surfaces by using a directed, inert and neutralized ion beam to physically sputter material from the optic surface. Recently, an ion beam figuring system KDIFS-500 has been designed and built in National University of Defense Technology (NUDT) of the P.R. China. KDIFS-500 is capable of processing workpiece up to Φ500mm. Line scanning process was discussed in detail for estimating the parameters of the beam removal function (BRF) in process. Experiments were conducted to demonstrate that the BRF increases gradually in process and by employing a stability control, the BRF can be kept stable in process. Finally, a Φ95 mm plano optical sample of CVD coated SiC substrate has been figured in two process iterations for demonstrating the correction capability of the KDIFS-500. Their figure convergence ratios reached 5.8 and 2.1 respectively. The actual figure residual errors were basically consistent with the predicted error. These consistencies indicated that the IBF processes on KDIFS-500 are predictable deterministic processes.
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