Revisiting Charge Trapping/Detrapping in Flash Memories From a Discrete and Statistical Standpoint—Part II: On-Field Operation and Distributed-Cycling Effects
暂无分享,去创建一个
Andrea L. Lacaita | Carmine Miccoli | Christian Monzio Compagnoni | Angelo Visconti | G. M. Paolucci | Alessandro S. Spinelli | Giovanni M. Paolucci | A. Lacaita | A. Visconti | A. Spinelli | C. M. Compagnoni | C. Miccoli
[1] A. Visconti,et al. Threshold-Voltage Instability Due to Damage Recovery in Nanoscale NAND Flash Memories , 2011, IEEE Transactions on Electron Devices.
[2] Kuniyoshi Yoshikawa,et al. Degradation mechanism of flash EEPROM programming after program/erase cycles , 1993, Proceedings of IEEE International Electron Devices Meeting.
[3] A. Goda,et al. Scaling directions for 2D and 3D NAND cells , 2012, 2012 International Electron Devices Meeting.
[4] J. Yugami,et al. A novel analysis method of threshold voltage shift due to detrap in a multi-level flash memory , 2001, 2001 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.01 CH37184).
[5] A. Visconti,et al. Comprehensive Analysis of Random Telegraph Noise Instability and Its Scaling in Deca–Nanometer Flash Memories , 2009, IEEE Transactions on Electron Devices.
[6] P. Kalavade,et al. Flash EEPROM threshold instabilities due to charge trapping during program/erase cycling , 2004, IEEE Transactions on Device and Materials Reliability.
[7] D. Schroder,et al. Degradation of thin tunnel gate oxide under constant Fowler-Nordheim current stress for a flash EEPROM , 1998 .
[8] C. Hu,et al. Random telegraph noise in flash memories - model and technology scaling , 2007, 2007 IEEE International Electron Devices Meeting.
[9] G. Verma,et al. Reliability performance of ETOX based flash memories , 1988 .
[10] A. Lacaita,et al. Investigation of the threshold voltage instability after distributed cycling in nanoscale NAND Flash memory arrays , 2010, 2010 IEEE International Reliability Physics Symposium.
[11] Kinam Kim,et al. Degradation of tunnel oxide by FN current stress and its effects on data retention characteristics of 90 nm NAND flash memory cells , 2003, 2003 IEEE International Reliability Physics Symposium Proceedings, 2003. 41st Annual..
[12] C. Miccoli,et al. Resolving discrete emission events: A new perspective for detrapping investigation in NAND Flash memories , 2013, 2013 IEEE International Reliability Physics Symposium (IRPS).
[13] Andrea L. Lacaita,et al. A new spectral approach to modeling charge trapping/detrapping in NAND Flash memories , 2014, 2014 IEEE International Reliability Physics Symposium.
[14] A. Lacaita,et al. Investigation of the RTN Distribution of Nanoscale MOS Devices From Subthreshold to On-State , 2013, IEEE Electron Device Letters.
[15] Y. Mori,et al. Analysis of detrap current due to oxide traps to improve flash memory retention , 2000, 2000 IEEE International Reliability Physics Symposium Proceedings. 38th Annual (Cat. No.00CH37059).
[16] A. Visconti,et al. Ultimate Accuracy for the nand Flash Program Algorithm Due to the Electron Injection Statistics , 2008, IEEE Transactions on Electron Devices.
[17] Carmine Miccoli,et al. Impact of Control-Gate and Floating-Gate Design on the Electron-Injection Spread of Decananometer nand Flash Memories , 2010, IEEE Electron Device Letters.
[18] Donggun Park,et al. Effects of interface trap generation and annihilation on the data retention characteristics of flash memory cells , 2004, IEEE Transactions on Device and Materials Reliability.
[19] K. Suh,et al. The Effect of Trapped Charge Distributions on Data Retention Characteristics of nand Flash Memory Cells , 2007, IEEE Electron Device Letters.
[20] Andrea L. Lacaita,et al. Revisiting Charge Trapping/Detrapping in Flash Memories From a Discrete and Statistical Standpoint—Part I: \(V_{T}\) Instabilities , 2014, IEEE Transactions on Electron Devices.
[21] G. M. Paolucci,et al. String Current in Decananometer nand Flash Arrays: A Compact-Modeling Investigation , 2012, IEEE Transactions on Electron Devices.
[22] C.M. Compagnoni,et al. Analytical Model for the Electron-Injection Statistics During Programming of Nanoscale nand Flash Memories , 2008, IEEE Transactions on Electron Devices.
[23] A. Visconti,et al. Scaling trends for random telegraph noise in deca-nanometer Flash memories , 2008, 2008 IEEE International Electron Devices Meeting.
[24] H. Belgal,et al. Recovery Effects in the Distributed Cycling of Flash Memories , 2006, 2006 IEEE International Reliability Physics Symposium Proceedings.
[25] Donggun Park,et al. Data retention characteristics of sub-100 nm NAND flash memory cells , 2003, IEEE Electron Device Letters.
[26] Kinam Kim,et al. The new program/erase cycling degradation mechanism of NAND flash memory devices , 2009, 2009 IEEE International Electron Devices Meeting (IEDM).
[27] A. Visconti,et al. Physical modeling of single-trap RTS statistical distribution in flash memories , 2008, 2008 IEEE International Reliability Physics Symposium.
[28] A.L. Lacaita,et al. Statistical Model for Random Telegraph Noise in Flash Memories , 2008, IEEE Transactions on Electron Devices.
[29] M. Ushiyama,et al. Read-disturb degradation mechanism due to electron trapping in the tunnel oxide for low-voltage flash memories , 1994, Proceedings of 1994 IEEE International Electron Devices Meeting.