Zr-silicate co-evaporated thin films

Thin films of Zr-silicate were deposited on silicon and BK7 glass substrates by EB co-evaporation. The mixing thermodynamics of the ZrO2 - SiO2 system was analysed. Chemical bonding in Zr-silicates has been studied by X-ray photoelectron spectroscopy. The structural and optical properties and the surface morphology were investigated.

[1]  P. McIntyre,et al.  Spinodal decomposition in amorphous metal–silicate thin films: Phase diagram analysis and interface effects on kinetics , 2002 .

[2]  S. Rhee,et al.  Atomic layer deposition of zirconium silicate films using zirconium tetra-tert-butoxide and silicon tetrachloride , 2003 .

[3]  Jack C. Lee,et al.  Ultrathin zirconium silicate film with good thermal stability for alternative gate dielectric application , 2000 .

[4]  Chemical phase separation in Zr silicate alloys: a spectroscopic study distinguishing between chemical phase separation with different degrees of micro- and nano-crystallinity , 2004 .

[5]  G. Lucovsky,et al.  Microscopic model for enhanced dielectric constants in low concentration SiO2-rich noncrystalline Zr and Hf silicate alloys , 2000 .

[6]  W. Ching,et al.  Electronic structure and dielectric properties of dielectric gate material (ZrO2)x(SiO2)1−x , 2004 .

[7]  P. Griffin,et al.  First principles investigation of scaling trends of zirconium silicate interface band offsets , 2001 .

[8]  Robert M. Wallace,et al.  Stable zirconium silicate gate dielectrics deposited directly on silicon , 2000 .

[9]  G. Lucovsky,et al.  A spectroscopic study distinguishing between chemical phase separation with different degrees of crystallinity in Hf(Zr) silicate alloys , 2004 .

[10]  W. Paszkowicz,et al.  Modification of zirconium oxide film microstructure during post-deposition annealing , 2003 .

[11]  E. Tois,et al.  Atomic layer deposition of hafnium and zirconium silicate thin films , 2003 .

[12]  J. L. Duggan,et al.  Thermally induced Zr incorporation into Si from zirconium silicate thin films , 2001 .

[13]  J. D. Casperson,et al.  Materials issues for layered tunnel barrier structures , 2002 .

[14]  K. Manabe,et al.  Spatially-resolved valence-electron energy-loss spectroscopy of Zr-oxide and Zr-silicate films , 2002 .

[15]  J. Mayer,et al.  Reactions of Zr thin films with SiO2 substrates , 1988 .

[16]  Heiji Watanabe.  Ultrathin zirconium silicate gate dielectrics with compositional gradation formed by self-organized reactions , 2002 .

[17]  Albert Feldman,et al.  Modifying structure and properties of optical films by coevaporation , 1986 .

[18]  T. Chao,et al.  Characterization of interfacial layer of ultrathin Zr silicate on Si(100) using spectroscopic ellipsometry and HRTEM , 2004 .

[19]  Charge Trapping in SiOx/ZrO2 and SiOx/TiO2 Gate Dielectric Stacks , 2001 .

[20]  D. Muller,et al.  Atomic scale measurements of the interfacial electronic structure and chemistry of zirconium silicate gate dielectrics , 2001 .

[21]  A spectroscopic study distinguishing between chemical phase separation with different degrees of crystallinity in Zr(Hf) silicate alloys , 2004 .

[22]  I. Baumvol,et al.  Stability of zirconium silicate films on Si under vacuum and O2 annealing , 2001 .

[23]  Chemical phase separation in Zr silicate alloys: a spectroscopic study distinguishing between chemical phase separation with different degree of micro- and nano-crystallinity , 2004 .