Advanced Silicon MOS Devices and Related Problems

The key to the tremendous progress in integrated circuits during the last decade has been the ability to reduce the size of individual devices and circuits through improvements in the photolithographic processing steps used to fabricate the structures. The projected era of Very Large Scale Integration (VLSI) in the near future relies on the continuation of this trend through further improvements in optical techniques or the application of newly developing electron-beam or X-ray patterning techniques with much higher resolution capability.

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