论文信息 - FABRICATION OF QUANTUM WIRES ON GaAs SUBSTRATES PATTERNED BY IN SITU ELECTRON-BEAM LITHOGRAPHY - 字舞流文

FABRICATION OF QUANTUM WIRES ON GaAs SUBSTRATES PATTERNED BY IN SITU ELECTRON-BEAM LITHOGRAPHY

I. Matsuyama | T. Ishikawa | M. López | N. Tanaka

[1] Masahiro Tsuchiya,et al. Formation of GaAs ridge quantum wire structures by molecular beam epitaxy on patterned substrates , 1994 .

[2] S. Hiyamizu,et al. Improved GaAs/AlAs multilayer structures grown by MBE on patterned GaAs (100) substrates with ridges along the (001) direction , 1993 .

[3] Y. Arakawa,et al. Fabrication of GaAs arrowhead‐shaped quantum wires by metalorganic chemical vapor deposition selective growth , 1993 .

[4] Y. Sugimoto,et al. Patterning of GaAs by in situ electron beam lithography toward nanometer-scale structures , 1992 .

[5] Y. Sugimoto,et al. Novel in situ pattern etching of GaAs by electron‐beam‐stimulated oxidation and subsequent Cl2 gas etching , 1991 .