A review of metal-ion-flux-controlled growth of metastable TiAlN by HIPIMS/DCMS co-sputtering
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Stephan Bolz | Jens Jensen | Lars Hultman | Jun Lu | Grzegorz Greczynski | Jun Lu | L. Hultman | G. Greczynski | O. Lemmer | J. Greene | J. Jensen | S. Bolz | Joseph E Greene | Werner Kölker | Ch. Schiffers | Oliver Lemmer | W. Kölker | C. Schiffers
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