Threshold voltage increase by quantum mechanical narrow channel effect in ultra-narrow MOSFETs
暂无分享,去创建一个
[1] A. Tasch,et al. Experimental determination of threshold voltage shifts due to quantum mechanical effects in MOS electron and hole inversion layers , 1997, IEEE Electron Device Letters.
[2] Yasuyuki Ohkura,et al. Quantum effects in Si n-MOS inversion layer at high substrate concentration , 1990 .
[3] Yasuo Takahashi,et al. Three-dimensional siloxane resist for the formation of nanopatterns with minimum linewidth fluctuations , 1998 .
[4] T. Makino,et al. Fabrication of 2-nm-wide silicon quantum wires through a combination of a partially-shifted resist pattern and orientation-dependent etching , 1997 .
[5] I. Omura,et al. IGBT negative gate capacitance and related instability effects , 1997, IEEE Electron Device Letters.
[6] Toshiro Hiramoto,et al. Coulomb blockade oscillations at room temperature in a Si quantum wire metal‐oxide‐semiconductor field‐effect transistor fabricated by anisotropic etching on a silicon‐on‐insulator substrate , 1996 .