Temperature dependence of optical properties of GaAs
暂无分享,去创建一个
[1] M. Cardona,et al. Interband critical points of GaAs and their temperature dependence. , 1987, Physical review. B, Condensed matter.
[2] S. Wright,et al. Improved GaAs substrate temperature measurement during molecular‐beam epitaxial growth , 1988 .
[3] F. Hottier,et al. In situ monitoring by ellipsometry of metalorganic epitaxy of GaAlAs‐GaAs superlattice , 1980 .
[4] A. A. Studna,et al. Chemical etching and cleaning procedures for Si, Ge, and some III‐V compound semiconductors , 1981 .
[5] John A. Woollam,et al. Variable angle of incidence spectroscopic ellipsometry: Application to GaAs‐AlxGa1−xAs multiple heterostructures , 1986 .
[6] R. Azzam,et al. Ellipsometry and polarized light , 1977 .
[7] D. Aspnes. Optimizing precision of rotating-analyzer ellipsometers , 1974 .
[8] David E. Aspnes,et al. Application of ellipsometry to crystal growth by organometallic molecular beam epitaxy , 1990 .
[9] D. Aspnes,et al. Investigation of effective-medium models of microscopic surface roughness by spectroscopic ellipsometry , 1979 .
[10] Gerald T. Cooney,et al. In Situ Spectroscopic Ellipsometry for Real Time Semiconductor Growth Monitor , 1990 .
[11] M. Erman,et al. Optical properties and damage analysis of GaAs single crystals partly amorphized by ion implantation , 1984 .
[12] A. A. Studna,et al. Dielectric functions and optical parameters of Si, Ge, GaP, GaAs, GaSb, InP, InAs, and InSb from 1.5 to 6.0 eV , 1983 .
[13] M. Erman,et al. Chemical and structural analysis of the GaAs/AlGaAs heterojunctions by spectroscopic ellipsometry , 1983 .
[14] C. T. Foxon,et al. The evaporation of GaAs under equilibrium and non-equilibrium conditions using a modulated beam technique , 1973 .
[15] P. S. Hauge,et al. Design and operation of ETA, an automated ellipsometer , 1973 .
[16] John A. Woollam,et al. Ellipsometric measurements of molecular‐beam‐epitaxy‐grown semiconductor multilayer thicknesses: A comparative study , 1987 .
[17] A. J. Barker. Optical Properties of Solids-New Developments , 1976 .
[18] GaAs(100) Surface Modifications at Elevated Temperatures, Studied By In-Situ Spectroscopic Ellipsometry , 1990 .
[19] Photoelectric Analysis of Polarized Light , 1962 .
[20] Adachi,et al. Excitonic effects in the optical spectrum of GaAs. , 1990, Physical review. B, Condensed matter.
[21] B. Seraphin. Optical Properties of Solids: New Developments , 1976 .
[22] D. Aspnes. Dielectric function and surface microroughness measurements of InSb by spectroscopic ellipsometry , 1980 .
[23] T. S. Moss,et al. Handbook on semiconductors , 1980 .
[24] Lester F. Eastman,et al. Variable angle spectroscopic ellipsometry - Application to GaAs-AlGaAs multilayer homogeneity characterization , 1988 .
[25] A. A. Studna,et al. Low-retardance fused-quartz window for real-time optical applications in ultrahigh vacuum , 1989 .