Angular‐resolved ion‐beam sputtering apparatus for large‐area deposition

A new apparatus to utilize the directional nature of ion‐beam sputter deposition is presented. Employment of an angular setting slit together with translational substrate scanning enables large‐area deposition, keeping the angular settings unchanged. The merits of this apparatus were demonstrated step by step on a typical example: CdTe obliquely deposited films known for the anomolous photovoltaic effect.

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