Investigation of EUV haze defect: molecular behaviors of mask cleaning chemicals on EUV mask surfaces
暂无分享,去创建一个
Andy Ma | Frank Goodwin | Greg Denbeaux | Jaehyuck Choi | Steve Novak | Yudhishthir Kandel | Han-shin Lee
[1] Uwe Dietze,et al. Effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance , 2011, European Mask and Lithography Conference.
[2] André M. Braun,et al. Photochemical processes for water treatment , 1993 .
[3] Cheol-Woong Yang,et al. Control of chemical residue on photomasks using thermal treatment , 2007 .
[4] Sang-Gyun Woo,et al. Substrate effects on the characteristics of haze defect formation on the photomask surface under exposure condition , 2007, Photomask Japan.
[5] Boris V. Yakshinskiy,et al. Carbon accumulation and mitigation processes, and secondary electron yields of ruthenium surfaces , 2007, SPIE Advanced Lithography.
[6] In-kyun Shin,et al. Effect of SPM-based cleaning POR on EUV mask performance , 2011, Photomask Technology.
[7] J. Hollenshead,et al. Modeling radiation-induced carbon contamination of extreme ultraviolet optics , 2006 .
[8] Hervé Fontaine,et al. Study of the airborne SO2 and NH3 contamination on Cr, MoSi, and quartz surfaces of photomasks , 2010, Photomask Technology.
[9] Jong-Min Kim,et al. Haze generation model and prevention techniques for sulfate free cleaned mask , 2009, Advanced Lithography.
[10] Kaustuve Bhattacharyya,et al. Reticle surface contaminants and their relationship to sub-pellicle defect formation , 2004, SPIE Advanced Lithography.
[11] Uwe Dietze,et al. Techniques for removal of contamination from EUVL mask without surface damage , 2010, Advanced Lithography.
[12] Ajay Kumar,et al. Theoretical study of mask haze formation , 2008, European Mask and Lithography Conference.
[13] Michael E. Malinowski,et al. Relation between electron- and photon-caused oxidation in EUVL optics , 2003, SPIE Advanced Lithography.
[14] Obert Wood,et al. A lifetime study of EUV masks , 2010, Photomask Technology.
[15] Ho Yong Jung,et al. Effect of UV/O3 treatment on mask surface to reducing sulfuric residue ions , 2004, SPIE Photomask Technology.
[16] Banqiu Wu,et al. Mask haze formation in deep ultraviolet lithography , 2007 .
[17] F. P. Bowden,et al. Chemical Thermodynamics , 1947, Nature.
[18] Han-Ku Cho,et al. A new paradigm for haze improvement: retardation of haze occurrence by creating mask substrate insensitive to chemical contamination level , 2008, Photomask Technology.
[19] Han-Ku Cho,et al. Prevention of chemical residue from growing into Haze defect on PSM pattern edge after normal cleaning process , 2008, Photomask Japan.
[20] Jacek S. Miller,et al. Oxidation of PAHs in water solution by ozone combined with ultraviolet radiation , 2001 .
[21] Burn Jeng Lin. Sober view on extreme ultraviolet lithography , 2006 .
[22] Oscar Han,et al. Novel cleaning techniques to achieve defect-free photomasks for sub-65-nm nodes , 2006, SPIE Photomask Technology.