Efficient light scattering modeling for alignment, metrology, and resist exposure in photolithography
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[1] Emil Wolf,et al. Principles of Optics: Contents , 1999 .
[2] Michael S. Yeung,et al. Modeling High Numerical Aperture Optical Lithography , 1988, Advanced Lithography.
[3] C. Burckhardt. Diffraction of a Plane Wave at a Sinusoidally Stratified Dielectric Grating , 1966 .
[4] H. P. Urbach,et al. Thin-film interference effects in photolithography for finite numerical apertures , 1991 .
[5] Andrzej J. Strojwas,et al. Modeling optical microscope images of integrated circuit structures , 1991 .
[6] G. S. Kino,et al. Imaging Theory For The Scanning Optical Microscope , 1989, Other Conferences.
[7] C. P. Kirk,et al. Optical microscope imaging of lines patterned in thick layers with variable edge geometry: theory , 1988 .
[8] Andrew R. Neureuther,et al. Experimental and simulation studies of alignment marks , 1991, Other Conferences.
[9] Roberto Guerrieri,et al. Understanding metrology of polysilicon gates through reflectance measurements and simulation , 1991, Other Conferences.
[10] D. Nyyssonen. Theory of optical edge detection and imaging of thick layers , 1982 .
[11] P. S. Hauge,et al. Characterization of positive photoresist , 1975, IEEE Transactions on Electron Devices.
[12] Charles A. Desoer,et al. Basic Circuit Theory , 1969 .
[13] R. Guerrieri,et al. Exploration of scattering from topography with massively parallel computers , 1989 .
[14] D. K. Vaughan,et al. Calculation Of Light Scatter From Structures On Silicon Surfaces , 1987, Advanced Lithography.
[15] F. Kaspar,et al. Diffraction by thick, periodically stratified gratings with complex dielectric constant , 1973 .
[16] Eytan Barouch,et al. Comprehensive 3-D notching simulator with nonplanar substrates , 1990, Advanced Lithography.
[17] Peter W. Cook,et al. Second-generation RISC floating point with multiply-add fused , 1990 .
[18] Chris P. Kirk,et al. Theoretical Models For The Optical Alignment Of Wafer Steppers , 1987, Advanced Lithography.
[19] Michael S. Yeung. Photolithography simulation on nonplanar substrates , 1990, Advanced Lithography.
[20] Andrzej J. Strojwas,et al. Modeling of optical alignment and metrology schemes used in integrated circuit manufacturing , 1990, Advanced Lithography.
[21] H. P. Urbach,et al. Modeling latent image formation in photolithography using the Helmholtz equation , 1990, Advanced Lithography.
[22] Roberto Guerrieri,et al. Investigation of reflective notching with massively parallel simulation , 1990, Advanced Lithography.
[23] H. P. Urbach,et al. Modeling latent-image formation in photolithography, using the Helmholtz equation , 1989 .
[24] A. J. Strojwas,et al. Modeling optical equipment for wafer alignment and line-width measurement , 1991 .
[25] Andrew R. Neureuther,et al. Edge-profile, materials, and protective coating effects on image quality , 1991, Other Conferences.
[26] J. Goodman. Introduction to Fourier optics , 1969 .
[27] Mark P. Davidson. Analytic waveguide solutions and the coherence probe microscope , 1991 .