Fabrication of a planar grating spectrograph by deep-etch lithography with synchrotron radiation

Abstract A three-layer resist system has been developed which can be used for light guiding. By structuring these layers with deep-etch X-ray lithography, high-precision multimode lightguide components with a relatively low attenuation can be produced. As a first example, a planar grating spectrograph with a self-focusing reflection grating has been fabricated together with fibre-fixing grooves. The spectro-graph shows an excellent dispersion of the light as well as a low cross-talk between the channels.