Modification Pathways for Copoly(2-oxazoline)s Enabling Their Application as Antireflective Coatings in Photolithography.
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[1] Microwave-Assisted Syntheses in Recyclable Ionic Liquids: Photoresists Based on Renewable Resources , 2015, ChemSusChem.
[2] R. Hoogenboom,et al. Functional Poly(2-oxazoline)s by Direct Amidation of Methyl Ester Side Chains , 2015 .
[3] R. Hoogenboom,et al. Poly(2-oxazoline)s and click chemistry: a versatile toolbox toward multi-functional polymers , 2015 .
[4] F. Wiesbrock,et al. Design Strategies for Functionalized Poly(2-oxazoline)s and Derived Materials , 2013 .
[5] A. Kelly,et al. Strategies for the synthesis of poly(2-oxazoline)-based hydrogels. , 2012, Macromolecular rapid communications.
[6] S. Monge,et al. How to modulate the chemical structure of polyoxazolines by appropriate functionalization. , 2012, Macromolecular rapid communications.
[7] F. Wiesbrock,et al. Water-developable poly(2-oxazoline)-based negative photoresists. , 2012, Macromolecular rapid communications.
[8] U. Schubert,et al. A green approach for the synthesis and thiol-ene modification of alkene functionalized poly(2-oxazoline)s. , 2011, Macromolecular rapid communications.
[9] Rob Schneiderman. Mobile Computing Has a Growing Impact on DSP Apps and Markets [Special Reports] , 2011, IEEE Signal Processing Magazine.
[10] Mark Slezak,et al. Advantages of BARC and photoresist matching for 193-nm photosensitive BARC applications , 2010, Advanced Lithography.
[11] H. Schlaad,et al. Thio-click modification of poly [2-(3-butenyl)-2-oxazoline] , 2007 .
[12] Douglas J. Guerrero,et al. A novel approach to developer-soluble anti-reflective coatings for 248-nm lithography , 2007, SPIE Advanced Lithography.
[13] R. Luxenhofer,et al. Click Chemistry with Poly(2-oxazoline)s , 2006 .
[14] D. Maruyama,et al. Adhesion improvement of ArF resist pattern depending on BARC material , 2006 .
[15] Douglas J. Guerrero,et al. Photochemical Studies on Bottom Anti-Reflective Coatings , 2006 .
[16] U. Schubert,et al. Investigation of the Living Cationic Ring-Opening Polymerization of 2-Methyl-, 2-Ethyl-, 2-Nonyl-, and 2-Phenyl-2-oxazoline in a Single-Mode Microwave Reactor† , 2005 .
[17] Joseph T. Kennedy,et al. Anthracene-organosiloxane spin-on antireflective coating for KrF lithography , 2003, SPIE Advanced Lithography.
[18] Tiao-Yuan Huang,et al. Low-dielectric constant bisbenzo(cyclobutene) and fluorinated poly(arylene)ether films as bottom anti-reflective coating layers for ArF lithography , 2001 .
[19] F. Houlihan,et al. Organic Materials Challenges for 193 nm Imaging , 1999 .
[20] Patrick Jean Paniez,et al. Bottom anti-reflective coatings: control of thermal processing , 1996 .
[21] J. Crivello,et al. Deep-UV Chemically Amplified Dissolution-Inhibited Photoresists , 1994 .
[22] C. Mack,et al. Absorption and exposure in positive photoresist. , 1988, Applied optics.
[23] J E Korka. Standing waves in photoresists. , 1970, Applied optics.
[24] S. Middelhoek. Projection masking, thin photoresist layers and interference effects , 1970 .