Application of attenuated phase-shifting masks to sub-130-nm lithography
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Qunying Lin | Siu Chung Tam | Lay Cheng Choo | Alex See | Shyue Seng Tan | Chee Kiong Koo | Hui Jun Lee
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[2] Chong-Cheng Fu,et al. Practicing extension of 248-nm DUV optical lithography using trim-mask PSM , 1999, Advanced Lithography.