No‐Heating Deposition of 1‐μm‐Thick Y‐Doped HfO2 Ferroelectric Films with Good Ferroelectric and Piezoelectric Properties by Radio Frequency Magnetron Sputtering Method
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H. Funakubo | T. Mimura | Takao Shimizu | T. Shiraishi | Akinori Tateyama | Tomoaki Yamada | Reijiro Shimura | Yoshitomo Tanaka | Y. Inoue