Fabrication and packaging of inertia micro-switch using low-temperature photo-resist molded metal-electroplating technology
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[1] T Tønnesen,et al. Simulation, design and fabrication of electroplated acceleration switches , 1997 .
[2] Wei Ma,et al. Fabrication and packaging of inertia micro-switch using metal-electroplating technology , 2003, The Sixteenth Annual International Conference on Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto. IEEE.
[3] E. Beyne,et al. Electrodeposition for the synthesis of microsystems , 2000 .
[4] K. Gilleo. Overview of new packages, materials and processes , 2001, Proceedings International Symposium on Advanced Packaging Materials Processes, Properties and Interfaces (IEEE Cat. No.01TH8562).
[5] H. Reichl,et al. Fabrication of high depth-to-width aspect ratio microstructures , 1992, [1992] Proceedings IEEE Micro Electro Mechanical Systems.
[6] Man Wong,et al. Design and characterization of micro-inertia switches fabricated using low-temperature metal-electroplating technology , 2003, SPIE MOEMS-MEMS.
[7] Bernd Loechel. Thick-layer resists for surface micromachining , 2000 .
[8] E. Beyne,et al. The indent reflow sealing (IRS) technique-a method for the fabrication of sealed cavities for MEMS devices , 2000, Journal of Microelectromechanical Systems.
[9] Josef Binder,et al. Additive electroplating technology as a post-CMOS process for the production of MEMS acceleration-threshold switches for transportation applications , 2000 .