β-FeSi2 based metal-insulator-semiconductor devices formed by sputtering for optoelectronic applications
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Zhengxin Liu | H. Tanoue | Y. Makita | T. Ootsuka | Y. Nakayama | Y. Fukuzawa | Naotaka Otogawa | Masato Osamura | N. Otogawa | M. Osamura