Bias dependence and light sensitivity of (Al, Ga)As/GaAs MODFET's at 77 K

Modulation doped field-effect transistors typically show a threshold-voltage shift of about 0.2 V at 77 K with respect to room temperature. An investigation of the characteristics of Al0.33Ga0.67As/ GaAs and Al0.24Ga0.76As/GaAs MODFET's confirms that the low temperature performance of these devices is affected by the presence of persistent photoconductive traps in the bulk (Al, Ga) As and the properties of the surface, both of which depend strongly on the Al mole fraction and the growth conditions. Al0.33Ga0.67As/GaAs MODFET's grown at 610°C show a threshold voltage shift of less than 0.05 V at 77 K with respect to room temperature and little sensitivity of the current-voltage characteristics on illumination and on bias condition, indicating that by proper control of the growth parameters it is possible to obtain high quality (Al, Ga)As/GaAs MODFET's suitable for operation 77K.

[1]  A. Gossard,et al.  Observation of intersubband scattering in a 2-dimensional electron system , 1982 .

[2]  T. Miers Schottky Contact Fabrication for GaAs MESFET's , 1982 .

[3]  D. Delagebeaudeuf,et al.  Metal-(n) AlGaAs-GaAs two-dimensional electron gas FET , 1982, IEEE Transactions on Electron Devices.

[4]  T. Mimura,et al.  Enhancement-Mode High Electron Mobility Transistors for Logic Applications , 1981 .

[5]  J. Moll,et al.  Field induced reemission of electrons trapped in SiO2 , 1979, IEEE Transactions on Electron Devices.

[6]  Michael S. Shur,et al.  TEMPERATURE DEPENDENCE OF THE I-V CHARACTERISTICS OF MODULATION-DOPED FETs. , 1983 .

[7]  W. G. Lyons,et al.  Characteristics of modulation‐doped AlxGa1−xAl/GaAs field‐effect transistors: Effect of donor‐electron separation , 1983 .

[8]  D. Lang,et al.  Trapping characteristics and a donor-complex ( DX ) model for the persistent-photoconductivity trapping center in Te-doped Al x Ga 1 − x As , 1979 .

[9]  Hadis Morkoç,et al.  Transport in modulation‐doped structures (AlxGa1−xAs/GaAs) and correlations with Monte Carlo calculations (GaAs) , 1982 .

[10]  W. Wiegmann,et al.  Two-dimensional electron gas at a semiconductor-semiconductor interface , 1979 .

[11]  T. Drummond,et al.  Interfacial properties of (Al,Ga)As/GaAs structures: Effect of substrate temperature during growth by molecular beam epitaxy , 1982 .

[12]  H. Morkoc,et al.  Model for modulation doped field effect transistor , 1982, IEEE Electron Device Letters.

[13]  Hadis Morkoç,et al.  Photoconductivity effects in extremely high mobility modulation‐doped (Al,Ga)As/GaAs heterostructures , 1982 .

[14]  M. Shur,et al.  Persistent photoconductivity in (Al,Ga)As/GaAs modulation doped structures: Dependence on structure and growth temperature , 1983 .

[15]  G. Vincent,et al.  Photoelectric memory effect in GaAs , 1982 .

[16]  J. Wysocki Drain-current distortion in CdSe thin-film transistors , 1982, IEEE Transactions on Electron Devices.

[17]  W. G. Lyons,et al.  Enhancement of electron velocity in modulation-doped (Al,Ga)As/GaAs FETs at cryogenic temperatures , 1982 .

[18]  Carlton M. Osburn,et al.  Effect of electron trapping on IGFET characteristics , 1977 .