Study of Ni‐Nb System by Ion Mixing

Amorphous thin films are formed by 300 ke V Xe+ ion mixing of multiple-layered samples in the Ni-Nb (f.c.c.–b.c.c.) system at four different compositions (Ni35Nb65, Ni55Nb45, Ni65Nb35, and Ni80Nb20). This confirms the “structural difference rule for amorphous alloy formation” by ion mixing. Some properties of the Ni-Nb amorphous thin films, including their recrystallization temperatures and irradiation stability, are studied. The amorphous alloy formation in this system, as well as the said properties, are compared to those of a similar system, the Ni-Mo (f.c.c.–b.c.c.) system. Des couches minces amorphes ont ete formees par mixage ionique de couches multiples Ni-Nb (f.c.c.–b.c.c.) en utilisant un faisceau Xe+ a 300 ke V. Des alliages Ni-Nb de quatre compositions differentes (Ni35Nb65, Ni55Nb45, Ni65Nb35 et Ni80Nb20) ont ete etudies. Les resultats confirment la regle de difference, structurelle pour la formation d'alliages amorphes par mixage ionique. On a etudie quelques proprietes des couches minces amorphes Ni-Nb tel que leur temperature de recristallisation et leur stabillte sous irradiation. L'article compare leur processus de formation ainsi que les proprietes mentionnees avec les caracteristiques du systeme similaire Ni-Mo (f.c.c.–b.c.c.).