Growth of boron nitride thin films by tuned substrate RF magnetron sputtering
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[1] V. Kulikovsky,et al. Preparation of thin hard boron nitride films by r.f. magnetron sputtering , 1995 .
[2] K. Bewilogua,et al. Infrared spectroscopic investigations on h-BN and mixed h/c-BN thin films , 1994 .
[3] W. Kulisch,et al. Mechanisms in ion induced c-BN growth , 1994 .
[4] Y. Zhang,et al. Effects of deposition parameters on the structure and properties of RF sputtered boron nitride , 1993 .
[5] Chuan Yi Tang,et al. A 2.|E|-Bit Distributed Algorithm for the Directed Euler Trail Problem , 1993, Inf. Process. Lett..
[6] P. N. Gibson,et al. Structural investigation of reactively sputtered boron nitride films , 1992 .
[7] H. Saitoh,et al. Growth of cubic boron nitride from vapor phase , 1992 .
[8] P. N. Gibson,et al. Mixed Phase Nanocrystalline Boron Nitride Films. Preparation and Characterization , 1991 .
[9] S. Alterovitz,et al. A Promising Boron-Carbon-Nitrogen Thin Film , 1990, Materials Science Forum.
[10] K. Reichelt,et al. The preparation of cubic boron nitride films by reactive diode sputtering , 1987 .
[11] F. Hickernell,et al. Radio frequency sputter deposited boron nitride films , 1984 .
[12] J. S. Logan. Control of RF sputtered film properties through substrate tuning , 1970 .
[13] William B. Pennebaker,et al. Electrical properties of RF sputtering systems , 1979 .