Langmuir probe diagnostic studies of pulsed hydrogen plasmas in planar microwave reactors

Langmuir probe techniques have been used to study time and spatially resolved electron densities and electron temperatures in pulse-modulated hydrogen discharges in two different planar microwave reactors (fmicrowave=2.45 GHz, tpulse= 1 ms). The reactors are (i) a standing-wave radiative slotted waveguide reactor and (ii) a modified traveling-wave radiative slotted waveguide reactor, which generate relatively large plasmas over areas from about 350 to 500 cm2. The plasma properties of these reactor types are of particular interest as they have been used for basic research and for plasma processing; for example, for surface treatment and layer deposition. In the present study the pressures and microwave powers in the reactors were varied between 33 and 55 Pa and 600 and 3600 W, respectively. In regions with high electromagnetic fields, shielded Langmuir probes were used to avoid disturbances of the probe characteristic. Close to the microwave windows of the reactors both the electron density and the electr...

[1]  J. Röpcke,et al.  Intensity distributions in R and P branches of (0–0) band of the A1Π→X1Σ+ electronic transition of the BH molecule and determination of gas temperature in non-equilibrium plasmas , 2002 .

[2]  A. Rousseau,et al.  Investigation of chemical kinetics and energy transfer in a pulsed microwave H2/CH4 plasma , 2001 .

[3]  J. Röpcke,et al.  Tunable Diode Laser Diagnostic Studies of H2-Ar-O2 Microwave Plasmas Containing Methane or Methanol , 1999 .

[4]  J. Dubau,et al.  Polarization measurements of the Al XII resonance line emitted from micropinch plasmas of a vacuum spark discharge , 1999 .

[5]  B. Lavrov,et al.  uv continuum emission and diagnostics of hydrogen-containing nonequilibrium plasmas , 1998, physics/9804008.

[6]  J. Behnisch,et al.  Mechanistic approach to the plasma polymerization of acrylic acid by a pulsed MW(ECR) plasma , 1998 .

[7]  J. Dankovicová.  Czech , 1997, Journal of the International Phonetic Association.

[8]  S. Samukawa,et al.  Essential points for precise etching processes in pulse-time-modulated ultrahigh-frequency plasma , 1997 .

[9]  P. Alnot,et al.  Combined effect of nitrogen and pulsed microwave plasma on diamond growth , 1997 .

[10]  J. Röpcke,et al.  Radiative characteristics of 3p Σ, Π; 3d Π−, Δ− states of H2 and determination of gas temperature of low pressure hydrogen containing plasmas , 1996 .

[11]  H. Makita,et al.  Fabrication of diamond films at low temperature by pulse-modulated magneto-active microwave plasma CVD , 1996 .

[12]  D. Korzec,et al.  Scaling of microwave slot antenna (SLAN): a concept for efficient plasma generation , 1996 .

[13]  J. Röpcke,et al.  Investigation of plasma surface cleaning in planar low-pressure microwave discharges , 1995 .

[14]  Sumio Ashida,et al.  Spatially averaged (global) model of time modulated high density argon plasmas , 1995 .

[15]  Michel Moisan,et al.  Plasma sources using long linear microwave field applicators: main features, classification and modelling , 1995 .

[16]  Y. Hikosaka,et al.  Diagnostics and control of radicals in an inductively coupled etching reactor , 1995 .

[17]  Milan Tichý,et al.  Langmuir Probe Determination of Charged Particle Number Density in a Flowing Afterglow Plasma , 1995 .

[18]  A. Rousseau,et al.  Pulsed microwave discharge: a very efficient H atom source , 1994 .

[19]  D. Korzec,et al.  Slot antenna 2.45 GHz microwave plasma source , 1994 .

[20]  A. Lichtenberg,et al.  Principles of Plasma Discharges and Materials Processing , 1994 .

[21]  S. Samukawa,et al.  Time‐modulated electron cyclotron resonance plasma discharge for controlling generation of reactive species , 1993 .

[22]  J. Röpcke,et al.  Influence of atomic hydrogen gradients on the growth rate and nucleation of diamond produced by microwave plasma assisted deposition , 1993 .

[23]  S. Iizuka,et al.  Uniform plasma produced by a plane slotted antenna with magnets for electron cyclotron resonance , 1993 .

[24]  J. Röpcke,et al.  Comparison of optical emission spectrometric measurements of the concentration and energy of species in low-pressure microwave and radiofrequency plasma sources , 1993 .

[25]  M. Moisan,et al.  Microwave discharges : fundamentals and applications , 1993 .

[26]  A. Ohl,et al.  Mechanism of substrate heating in diamond-forming low-pressure microwave discharges , 1992 .

[27]  M. Moisan,et al.  Microwave excited plasmas , 1992 .

[28]  M. Tichý,et al.  The use of Langmuir Probe Methods for Plasma Diagnostic in Middle Pressure Discharges , 1990 .

[29]  Antoine Durandet,et al.  Microwave multipolar plasmas excited by distributed electron cyclotron resonance: concept and performance , 1988 .

[30]  R. Boswell,et al.  Pulsed high rate plasma etching with variable Si/SiO2 selectivity and variable Si etch profiles , 1985 .

[31]  M. Tichý,et al.  A contribution to the assessment of the influence of collisions on the measurements with Langmuir probes in the thick sheath working regime , 1985 .

[32]  Z. Zakrzewski,et al.  RESEARCH NOTES: Effect of collisions on positive ion collection by a cylindrical Langmuir probe , 1974 .

[33]  A. Jakubowski.  Effect of Angle of Incidence on the Response of Cylindrical Electrostatic Probes at Supersonic Speeds , 1972 .

[34]  James F. Allen,et al.  The Collection of Positive Ions by a Probe Immersed in a Plasma , 1957 .

[35]  S. Brown,et al.  Microwave Study of Positive Ion Collection by Probes , 1955 .

[36]  R. K. Wakerling,et al.  The characteristics of electrical discharges in magnetic fields , 1949 .