Determination of pore size distribution in thin organized mesoporous silica films by spectroscopic ellipsometry in the visible and infrared range
暂无分享,去创建一个
C. Sanchez | D. Grosso | S. Fisson | J. Rivory | F. Cagnol | A. Bourgeois | A. B. Bruneau | B. Demarets
[1] Galo J. A. A. Soler-Illia,et al. Humidity-controlled mesostructuration in CTAB-templated silica thin film processing. The existence of a modulable steady state , 2003 .
[2] K. Nakai,et al. Development of the ultra-high-sensitive Kr adsorption technique to evaluate the pore-size distribution of thin-film materials , 2002 .
[3] Galo J. A. A. Soler-Illia,et al. Phase transformation during cubic mesostructured silica film formation. , 2002, Chemical communications.
[4] A. R. Balkenende,et al. An in Situ Study of Mesostructured CTAB−Silica Film Formation during Dip Coating Using Time-Resolved SAXS and Interferometry Measurements , 2002 .
[5] M. R. Baklanov,et al. Determination of pore size distribution in thin films by ellipsometric porosimetry , 2000 .
[6] D. Taylor,et al. Technique for characterization of thin film porosity , 1998 .
[7] Patrick Chaton,et al. Infrared ellipsometry study of evaporated SiO2 films: Matrix densification, porosity, water sorption , 1997 .
[8] K. Morishige,et al. Capillary Critical Point of Argon, Nitrogen, Oxygen, Ethylene, and Carbon Dioxide in MCM-41 , 1997 .
[9] P. Llewellyn,et al. Effect of pore size on adsorbate condensation and hysteresis within a potential model adsorbent: M41S , 1994 .
[10] J. K. Srivastava,et al. Low‐temperature growth of silicon dioxide films: A study of chemical bonding by ellipsometry and infrared spectroscopy , 1987 .
[11] K. Sing,et al. Physisorption of argon, nitrogen and oxygen by MCM-41, a model mesoporous adsorbent , 1994 .
[12] E. Barrett,et al. (CONTRIBUTION FROM THE MULTIPLE FELLOWSHIP OF BAUGH AND SONS COMPANY, MELLOX INSTITUTE) The Determination of Pore Volume and Area Distributions in Porous Substances. I. Computations from Nitrogen Isotherms , 1951 .