论文信息 - Measuring refractive index and thickness of thin films: a new technique.

Measuring refractive index and thickness of thin films: a new technique.

Properties of a leaky quasi-waveguide formed by a thin film of refractive index smaller than the substrate are described. By exciting these leaky waves through the substrate, we have demonstrated a convenient and accurate method of measuring both the refractive index and thickness of thin films. Experimental results are given for polystyrene, with a demonstrated accuracy comparable with both that of prism coupling into a waveguiding film and with ellipsometry.

E Garmire | E. Garmire | T N Ding | T. Ding

[1] R Ulrich,et al. Measurement of thin film parameters with a prism coupler. , 1973, Applied optics.

[2] C. Vassallo. Radiating normal modes of lossy planar waveguides , 1979 .

[3] R.Th. Kersten,et al. A new method for measuring refractive index and thickness of liquid and deposited solid thin films , 1975 .

[4] A. C. Adams,et al. An Evaluation of the Prism Coupler for Measuring the Thickness and Refractive Index of Dielectric Films on Silicon Substrates , 1979 .

[5] C. Mogab,et al. Plasma silicon oxide films on garnet substrates: measurement of their thickness and refractive index by the prism coupling technique. , 1981, Applied optics.

[6] P. Herrmann,et al. Determination of thickness, refractive index, and dispersion of waveguiding thin films with an Abbe refractometer. , 1980, Applied optics.

[7] Wilhelm Prettl,et al. Planar leaky light-guides and couplers , 1973 .

[8] Keiji Tanaka. Measurements of refractive‐index dispersion by optical waveguiding , 1979 .

[9] R. J. Martin,et al. MODES OF PROPAGATING LIGHT WAVES IN THIN DEPOSITED SEMICONDUCTOR FILMS , 1969 .