Interval Workshop MISC'99

A bipolar logic gate formed in an isolated N-type epitaxial layer in an integrated circuit device includes a normally operated vertical NPN switch transistor clamped by an inversely operated NPM clamp transistor. The base of the clamp transistor is formed by a high energy boron ion implant into a portion of the N-type epitaxial layer extending through the P-type base of the switch transistor. Multiple outputs are provided by Schottky barrier diodes formed on the N-type epitaxial layer.