Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
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Suhye Park | H. Jeon | S. Song | C. Jung | Jong Woo Kim | Namgue Lee | Jong-Wha Kim | Hyunwoo Park | Hyeongsu Choi | H. Yuk | Keunsik Kim | Youngjoon Kim | Haewon Cho | Young-Jun Choi | Yurim Kwon | Y. Kwon