Poly-Si/AlN/HfSiO Stack for Ideal Threshold Voltage and Mobility in Sub-100 nm MOSFETs
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P. Oldiges | V. Narayanan | M. Steen | R. Jammy | M. Ieong | V. Paruchuri | P. Kozlowski | J. Newbury | E. Sikorski | S. Zafar | M. Gribelyuk | E. Cartier | S. Guha | P. Jamison | P. Flaitz | B. Linder | M.M. Frank | N. Bojarczuk | K.L. Lee | X. Wang | J. Rubino | G. Singco
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