Run-toRun Overlay Control of Steppers in Semiconductor Manufacturing Systems Based on History Data Analysis and Neural Network Modeling
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Kwang-Hyun Cho | Jong-Tae Lim | Sung-Young Shin | Seong-Jin Park | Bong-Su Cho | Young-Ho Jei | Moon-Sang Lee | Myung-Kil Kim | Chan-Hoon Park
[1] Harry J. Levinson,et al. Principles of Lithography , 2001 .
[2] N. Patel,et al. Adaptive optimization of run-to-run controllers: the EWMA example , 2000 .
[3] Spencer Graves. STATISTICAL QUALITY CONTROL OF A MULTISTEP PRODUCTION PROCESS USING TOTAL PROCESS YIELD , 1998 .
[4] Jong-Tae Lim,et al. Synthesis of fault-tolerant supervisor for automated manufacturing systems: a case study on photolithographic process , 1998, IEEE Trans. Robotics Autom..
[5] Warren W. Flack,et al. Monitoring and diagnostic techniques for control of overlay in steppers , 1995, Advanced Lithography.
[6] Pramod P. Khargonekar,et al. A probabilistic approach to run-to-run control , 1998 .
[7] Jingang Yi,et al. Neural network based uniformity profile control of linear chemical-mechanical planarization , 2003 .
[8] Simon Haykin,et al. Neural Networks: A Comprehensive Foundation , 1998 .
[9] Jinn-Yi Yeh,et al. An adaptive run-to-run optimizing controller for linear and nonlinear semiconductor processes , 1998, ICMTS 1998.
[10] Warren W. Flack,et al. Process Control of Stepper Overlay Using Multivariate Techniques , 1995 .
[11] J. Si,et al. Monitoring and control of semiconductor manufacturing processes , 1998 .
[12] R. L. Mahajan,et al. Artificial neural network model-based run-to-run process controller , 1996 .
[13] Martin T. Hagan,et al. Neural network design , 1995 .
[14] M. Hankinson,et al. Run-to-run critical dimension and sidewall angle lithography control using the PROLITH simulator , 2004, IEEE Transactions on Semiconductor Manufacturing.
[15] Christopher A. Bode,et al. Lithography overlay controller formulation , 2000, SPIE Advanced Lithography.
[16] S. Adivikolanu,et al. Extensions and performance/robustness tradeoffs of the EWMA run-to-run controller by using the internal model control structure , 2000 .
[17] Aaas News,et al. Book Reviews , 1893, Buffalo Medical and Surgical Journal.