论文信息 - Atomic layer deposition grown metal-insulator-metal capacitors with RuO2 electrodes and Al-doped rutile TiO2 dielectric layer - 字舞流文

Atomic layer deposition grown metal-insulator-metal capacitors with RuO2 electrodes and Al-doped rutile TiO2 dielectric layer

J. Aarik | E. Dobročka | B. Hudec | A. Vincze | A. Tarre | A. Kasikov | K. Fröhlich | K. Hušeková | R. Rammula