Low Temperature Deposition of TiO2 Thin Films through Atmospheric Pressure Plasma Jet Processing
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A. Fujishima | S. Gosavi | T. Kondo | S. S. Latthe | K. Teshima | C. Terashima | M. Yuasa | N. Suzuki | Nitish Roy | Y. Hunge | R. Tabei | Katsuya Teshima