Comparison of HfO2 films grown by atomic layer deposition using HfCl4 and H2O or O3 as the oxidant
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Ho-Kyu Kang | Jong-Ho Lee | Cheol Seong Hwang | Moonju Cho | Nae-In Lee | Hong-bae Park | Se-Jung Oh | Ho-Kyu Kang | C. Hwang | Jong-Ho Lee | N. Lee | Jaehoon Park | Hong-bae Park | S. Lee | Moonju Cho | Jong-Cheol Lee | Jaehoo Park | Jong-Cheol Lee | Suk Woo Lee | Jong-Pyo Kim | Se-Jung Oh | Jong-Pyo Kim
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