Electrical model of a PMOS body biased structure in triple-well technology under pulsed photoelectric laser stimulation
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[1] K. Haraguchi,et al. Microscopic optical beam induced current measurements and their applications , 1994, Conference Proceedings. 10th Anniversary. IMTC/94. Advanced Technologies in I & M. 1994 IEEE Instrumentation and Measurement Technolgy Conference (Cat. No.94CH3424-9).
[2] Wenceslas Rahajandraibe,et al. Characterization and Simulation of a Body Biased Structure in Triple-Well Technology Under Pulsed Photoelectric Laser Stimulation , 2014 .
[3] Jean-Max Dutertre,et al. Building the electrical model of the pulsed photoelectric laser stimulation of a PMOS transistor in 90nm technology , 2013, Proceedings of the 20th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA).
[4] C. Boit,et al. Systematic Characterization of Integrated Circuit Standard Components as Stimulated by Scanning Laser Beam , 2007, IEEE Transactions on Device and Materials Reliability.
[5] Kaushik Roy,et al. Technology scaling behavior of optimum reverse body bias for standby leakage power reduction in CMOS IC's , 1999, Proceedings. 1999 International Symposium on Low Power Electronics and Design (Cat. No.99TH8477).
[6] Christer Svensson,et al. Trading speed for low power by choice of supply and threshold voltages , 1993 .
[7] Robert G. Meyer,et al. Analysis and Design of Analog Integrated Circuits , 1993 .
[8] A. Sarafianos,et al. Building the electrical model of the pulsed photoelectric laser stimulation of an NMOS transistor in 90nm technology , 2013, 2013 IEEE International Reliability Physics Symposium (IRPS).
[9] Wenceslas Rahajandraibe,et al. Electrical model of an NMOS body biased structure in triple-well technology under photoelectric laser stimulation , 2015, 2015 IEEE International Reliability Physics Symposium.