Compact Z-pinch EUV source for photolithography
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Uwe Stamm | Dirk Basting | Vladimir M. Borisov | Guido Schriever | Manfred Rahe | Oleg B. Khristoforov | Aleksandr Yu. Vinokhodov
[1] Guido Schriever,et al. Extreme ultraviolet light generation based on laser-produced plasmas (LPP) and gas-discharge-based pinch plasmas: a comparison of different concepts , 2000, Advanced Lithography.
[2] Dieter Hoffmann,et al. Extreme-ultraviolet source development: a comparison of different concepts , 2000, SPIE Optics + Photonics.