论文信息 - Charge retention phenomena in CT silicon nitride: Impact of technology and operating conditions - 字舞流文

Charge retention phenomena in CT silicon nitride: Impact of technology and operating conditions

E. Camerlenghi | A. Spinelli | C. M. Compagnoni | S. Amoroso | A. Grossi | G. Ghidini | R. Piagge | P. Tessariol | A. Mauri | A. Maconi | A. Sebastiani | C. Scozzari | N. Galbiati | M. Alessandri | A. D. Vitto | G. Albini | I. Baldi | E. Moltrasio | E. Mascellino