Aberration measurement of projection optics in lithographic tools based on two-beam interference theory.
暂无分享,去创建一个
[1] Kafai Lai,et al. New paradigm in lens metrology for lithographic scanner: evaluation and exploration , 2004, SPIE Advanced Lithography.
[2] Gerhard Kunkel,et al. Aberration measurement using in-situ two-beam interferometry , 2001, SPIE Advanced Lithography.
[3] Reiner Garreis,et al. Impact of wavefront errors on low k1 processes at extremely high NA , 2003, SPIE Advanced Lithography.
[4] Greg P. Hughes,et al. Aberration determination in early 157-nm exposure system , 2002, SPIE Advanced Lithography.
[5] Tomoyuki Matsuyama,et al. Analysis of imaging performance degradation , 2003, SPIE Advanced Lithography.
[6] Timothy A. Brunner,et al. Impact of lens aberrations on optical lithography , 1997, IBM J. Res. Dev..
[7] Xiang-zhao Wang,et al. Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask. , 2006, Applied optics.
[8] H. Nomura,et al. Aberration measurement from specific photolithographic images: a different approach. , 2000, Applied optics.
[9] Chen-Ming Huang,et al. Influence of coma effect on scanner overlay , 2002, SPIE Advanced Lithography.
[10] H. Nomura,et al. Techniques for measuring aberrations in lenses used in photolithography with printed patterns. , 1999, Applied optics.