Integration of a templated directed self-assembly-based hole shrink in a short loop via chain

Abstract. The use of directed self-assembly (DSA) of cylinder forming block copolymers (BCP) for contact hole shrink applications has gained increased attention due to the dimensions that can be achieved with this materials. Recent work has focused on engineering the dimensions and surface energy of the templates to obtain straight profiles of the cylinders assembled in them. However, the impact of process optimization on defect formation is measured using scanning electron microscopy before and after transferring the BCP features to a hardmask, which provides limited information about the presence of defects or three-dimensional morphologies in the polymer structures. To identify the presence of single defects in arrays of various densities and sizes, we use Kelvin and chain structures available in the IMEC 28-nm node via chain electrical test vehicle, Everest, in combination with templated DSA. We tuned the surface energy and dimensions of the templates with the use of random copolymers and through the exposure conditions, respectively. Finally, the contact holes obtained with templated DSA of BCP were subsequently transferred into a relevant stack to apply advanced metallization processes and, ultimately, validated electrically.

[1]  Eungnak Han,et al.  Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats , 2011 .

[2]  Geert Vandenberghe,et al.  Implementation of templated DSA for via layer patterning at the 7nm node , 2015, Advanced Lithography.

[3]  J. Andres Torres,et al.  Physical verification and manufacturing of contact/via layers using grapho-epitaxy DSA processes , 2014, Advanced Lithography.

[4]  Seiji Nagahara,et al.  Driving DSA into volume manufacturing , 2015, Advanced Lithography.

[5]  Benjamen M. Rathsack,et al.  Graphoepitaxial assembly of cylinder forming block copolymers in cylindrical holes , 2015 .

[6]  L. Pain,et al.  The potential of block copolymer’s directed self-assembly for contact hole shrink and contact multiplication , 2013, Advanced Lithography.

[7]  Roel Gronheid,et al.  Influence of template fill in graphoepitaxy directed self-assembly , 2016 .

[8]  R. Ruiz,et al.  Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly , 2008, Science.

[9]  Roel Gronheid,et al.  Progress in directed self-assembly hole shrink applications , 2013, Advanced Lithography.

[10]  Ji Xu,et al.  Simulations of spatial DSA morphology, DSA-aware assist features and block copolymer-homopolymer blends , 2014, Advanced Lithography.

[11]  T. Yamauchi,et al.  Evaluation of integration schemes for contact-hole grapho-epitaxy DSA: a study of substrate and template affinity control , 2014, Advanced Lithography.

[12]  G. Fredrickson,et al.  Self‐consistent field theory investigation of directed self‐assembly in cylindrical confinement , 2015 .

[13]  V. Farys,et al.  Template affinity role in CH shrink by DSA planarization , 2015, Advanced Lithography.

[14]  Yi Cao,et al.  Implementation of surface energy modification in graphoepitaxy directed self-assembly for hole multiplication , 2015 .

[15]  Christophe Navarro,et al.  Optimization of block copolymer self-assembly through graphoepitaxy: A defectivity study , 2011 .