Ion energy and angular distributions in inductively coupled radio frequency discharges in argon
暂无分享,去创建一个
D. C. Meister | Joseph Ray Woodworth | Herbert H. Sawin | H. Sawin | J. Woodworth | Merle E. Riley | M. Riley | B. P. Aragon | Minh S. Le | B. Aragon | D. Meister
[1] D. Hess,et al. Ion transit through capacitively coupled Ar sheaths: Ion current and energy distribution , 1988 .
[2] J. K. Olthoff,et al. The Gaseous Electronics Conference RF Reference Cell—An Introduction , 1995, Journal of research of the National Institute of Standards and Technology.
[3] Herbert H. Sawin,et al. Ion bombardment in rf plasmas , 1990 .
[4] S. Radelaar,et al. CL2 REACTIVE ION ETCHING MECHANISMS STUDIED BY IN SITU DETERMINATION OF ION ENERGY AND ION FLUX , 1991 .
[5] A. Lichtenberg,et al. Principles of Plasma Discharges and Materials Processing , 1994 .
[6] J. A. Hornbeck. THE DRIFT VELOCITIES OF MOLECULAR AND ATOMIC IONS IN HELIUM, NEON, AND ARGON , 1951 .
[7] Erwin Frederick Jaeger,et al. Power deposition in high-density inductively coupled plasma tools for semiconductor processing , 1995 .
[8] Gregory A. Hebner,et al. An Inductively Coupled Plasma Source for the Gaseous Electronics Conference RF Reference Cell , 1995, Journal of research of the National Institute of Standards and Technology.
[9] U. Flender,et al. Ion distribution functions behind an RF sheath , 1994 .
[10] B. Lipschultz,et al. ELECTRIC PROBES IN PLASMAS , 1985 .
[11] J. Hopwood. Ion bombardment energy distributions in a radio frequency induction plasma , 1993 .
[12] K. Riemann,et al. Kinetic theory of the plasma sheath transition in a weakly ionized plasma , 1981 .
[13] M. Lieberman,et al. Global model of Ar, O2, Cl2, and Ar/O2 high‐density plasma discharges , 1995 .
[14] P. Taylor. Construction of pierced hemispherical grids , 1988 .
[15] I. Hutchinson. Principles of Plasma Diagnostics , 1987 .
[16] J. Simpson,et al. DESIGN OF RETARDING FIELD ENERGY ANALYZERS , 1961 .
[17] P. Koidl,et al. Ion and electron dynamics in the sheath of radio‐frequency glow discharges , 1991 .
[18] P. Jones,et al. Effects of atomic chlorine wall recombination: Comparison of a plasma chemistry model with experiment , 1995 .
[19] G. Matthews. A combined retarding field analyser and E×B probe for measurement of ion and electron energy distribution in tokamak edge plasmas , 1984 .
[20] W. D. Davis,et al. Ion Energies at the Cathode of a Glow Discharge , 1963 .
[21] J. G. Laframboise,et al. Orifice probe for plasma diagnostics: II. Multi-parameter analysis , 1974 .
[22] R. V. Van Brunt,et al. Studies of Ion Kinetic-Energy Distributions in the Gaseous Electronics Conference RF Reference Cell , 1995, Journal of research of the National Institute of Standards and Technology.
[23] E. W. McDaniel,et al. Collision phenomena in ionized gases , 1964 .
[24] H. Sawin,et al. Ion bombardment energy distributions in radio‐frequency glow‐discharge systems , 1986 .
[25] L. Mahoney,et al. Electron‐density and energy distributions in a planar inductively coupled discharge , 1994 .
[26] A. Molvik. Large acceptance angle retarding‐potential analyzers , 1981 .
[27] S. Ingram,et al. Ion and electron energy analysis at a surface in an RF discharge , 1988 .
[28] R. J. Brunt,et al. Ion kinetic‐energy distributions in argon rf glow discharges , 1992 .
[29] U. Kortshagen,et al. Ion energy distribution functions in a planar inductively coupled RF discharge , 1995 .
[30] A. Roosmalen,et al. Dry Etching for VLSI , 1991 .
[31] David B. Graves,et al. The Gaseous Electronics Conference radio‐frequency reference cell: A defined parallel‐plate radio‐frequency system for experimental and theoretical studies of plasma‐processing discharges , 1994 .