论文信息 - Optimization considerations for 4 μm SOI-waveguide technology with respect to polarization dependence

Optimization considerations for 4 μm SOI-waveguide technology with respect to polarization dependence

The geometry of 4 μm silicon rib waveguides was optimized to reduce sensitivity of modal birefringence to process & substrate nonuniformities. Similar birefringence uniformities have been demonstrated experimentally on BESOI and SmartCut material.

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