RF compensation of double Langmuir probes: modelling and experiment
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[1] R. R. J. Gagné,et al. Investigation of an rf Plasma with Symmetrical and Asymmetrical Electrostatic Probes , 1972 .
[2] J. Howard,et al. Design and characterization of the Magnetized Plasma Interaction Experiment (MAGPIE): a new source for plasma–material interaction studies , 2012 .
[3] J. Coburn,et al. Positive‐ion bombardment of substrates in rf diode glow discharge sputtering , 1972 .
[4] D. Blackwell,et al. Upper Limit to Landau Damping in Helicon Discharges , 1999 .
[5] Pascal Chabert,et al. Physics of radio-frequency plasmas , 2011 .
[6] J. Swift,et al. New books - Electrical probes for plasma diagnostics , 1970 .
[7] M. Meyyappan,et al. Ion dynamics model for collisionless radio frequency sheaths , 2000 .
[8] R. Holmes,et al. Frequency Conversion in the Sheath Capacitance of a Glow Discharge Plasma , 1968 .
[9] A. Gallimore,et al. An ion thruster internal discharge chamber electrostatic probe diagnostic technique using a high-speed probe positioning system. , 2008, The Review of scientific instruments.
[10] C. Chung,et al. Double probe diagnostics based on harmonic current detection for electron temperature and electropositive ion flux measurement in RF plasmas , 2012 .
[11] L. Malter,et al. A Floating Double Probe Method for Measurements in Gas Discharges , 1950 .
[12] Francis F. Chen,et al. Langmuir probe analysis for high density plasmas , 2001 .
[13] Chin-Wook Chung,et al. Floating probe for electron temperature and ion density measurement applicable to processing plasmas , 2007 .
[14] G. Oost,et al. On the harmonic technique to measure electron temperature with high time resolution , 1999 .
[15] A. Boschi,et al. Effect of a R.F, signal on the characteristic of a langmuir probe , 1963 .
[16] R. Boswell,et al. Transient RF self-bias in electropositive and electronegative plasmas , 2003 .
[17] Francis F. Chen,et al. RF compensated probes for high-density discharges , 1994 .
[18] J. Engemann,et al. Langmuir probe measurements in commercial plasma plants , 1994 .
[19] A. Ellingboe,et al. Analysis of uncompensated Langmuir probe characteristics in radio-frequency discharges revisited , 2006 .
[20] J. Allen,et al. On the use of double probes in RF discharges , 1992 .
[21] M. Tuszewski,et al. The accuracy of Langmuir probe ion density measurements in low-frequency RF discharges , 1996 .
[22] L. van der Sluis,et al. Vacuum Circuit Breaker Postarc Current Modelling Based on the Theory of Langmuir Probes , 2007, IEEE Transactions on Plasma Science.
[23] C. Steinbrüchel,et al. Analysis of Langmuir probe data: Analytical parametrization, and the importance of the end effect , 2001 .
[24] Valery Godyak,et al. Probe measurements of electron-energy distributions in plasmas: what can we measure and how can we achieve reliable results? , 2011 .
[25] N. Braithwaite,et al. A comparison of a passive (filtered) and an active (driven) probe for RF plasma diagnostics , 1991 .
[26] Yue Liu,et al. Characteristics of a plasma sheath in a radio frequency biased voltage , 2004 .
[27] A. Wendt. Passive external radio frequency filter for Langmuir probes , 2001 .
[28] Jean-Paul Booth,et al. A novel electrostatic probe method for ion flux measurements , 1996 .
[29] J. G. Laframboise. Theory of spherical and cylindrical Langmuir probes in a collisionless , 1966 .
[30] C. Chung,et al. Measurement of electron temperature and ion density using the self-bias effect in plasmas , 2010 .
[31] Robert B. Piejak,et al. Probe measurements of the space potential in a radio frequency discharge , 1990 .
[32] Daniel Brown,et al. Improved analysis techniques for cylindrical and spherical double probes. , 2012, The Review of scientific instruments.
[33] K. Riemann. The validity of Bohm's sheath criterion in rf discharges , 1992 .
[34] C. Chung,et al. Measurement of the sheath capacitance of a planar probe , 2011 .
[35] E. Aydil,et al. Modeling of the sheath and the energy distribution of ions bombarding rf-biased substrates in high density plasma reactors and comparison to experimental measurements , 1999 .
[36] C. Steinbrüchel,et al. A new method for analyzing Langmuir probe data and the determination of ion densities and etch yields in an etching plasma , 1990 .
[37] Francis F. Chen,et al. Time-varying impedance of the sheath on a probe in an RF plasma , 2006 .
[38] J. Howard,et al. Plasma parameters and electron energy distribution functions in a magnetically focused plasma , 2013 .
[39] M. Lieberman,et al. Ion energy distributions in rf sheaths; review, analysis and simulation , 1999 .