Resputtering during the growth of pulsed-laser-deposited metallic films in vacuum and in an ambient gas
暂无分享,去创建一个
[1] Jo,et al. Angle-resolved energy distributions of laser ablated silver ions in vacuum , 1998 .
[2] X. W. Sun,et al. Correlation between plasma dynamics and thin film properties in pulsed laser deposition , 1997 .
[3] C. Choy,et al. The role of ambient gas scattering effect and lead oxide formation in pulsed laser deposition of lead–zirconate–titanate thin films , 1996 .
[4] G. Sepold,et al. Plasma parameters in pulsed laser-plasma deposition of thin films , 1996 .
[5] S. Fähler,et al. Calculations and experiments of material removal and kinetic energy during pulsed laser ablation of metals , 1996 .
[6] C. Afonso,et al. The role of film re‐emission and gas scattering processes on the stoichiometry of laser deposited films , 1995 .
[7] C. L. Choy,et al. Intrinsic resputtering in pulsed‐laser deposition of lead‐zirconate‐titanate thin films , 1995 .
[8] N. Ghoniem,et al. Molecular-dynamics simulations of low-energy copper atom interaction with copper surfaces , 1993 .
[9] J. Kools,et al. Angle‐resolved time‐of‐flight studies on ground‐state neutrals formed by near‐threshold excimer laser ablation of copper , 1993 .
[10] N. Cherief,et al. Laser ablation deposition of metallic films and bilayers (Fe, rare earth and R/Fe bilayers) , 1993 .
[11] J. Kools,et al. Concentrations and velocity distributions of positive ions in laser ablation of copper , 1991 .
[12] P. Dyer. Electrical characterization of plasma generation in KrF laser Cu ablation , 1989 .
[13] R. Dreyfus,et al. Electronic probe measurements of pulsed copper ablation at 248 nm , 1989 .
[14] P. L. Salter,et al. Materials analysis by laser-probe mass spectrometry , 1976 .
[15] P. Sigmund. Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets , 1969 .