Trapping in $\text{Al}_{2}\mathrm{O}_{3}/\text{GaN}$ MOScaps investigated by fast capacitive techniques
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Eldad Bahat Treidel | M. Meneghini | G. Meneghesso | E. Zanoni | C. de Santi | M. Fregolent | Alberto Marcuzzi
[1] M. Meneghini,et al. Logarithmic trapping and detrapping in β-Ga2O3 MOSFETs: Experimental analysis and modeling , 2022, Applied Physics Letters.
[2] S. Decoutere,et al. Study and characterization of GaN MOS capacitors: Planar vs trench topographies , 2022, Applied Physics Letters.
[3] S. Chowdhury,et al. 2.8 kV Avalanche in Vertical GaN PN Diode Utilizing Field Plate on Hydrogen Passivated P-Layer , 2022, IEEE Electron Device Letters.
[4] M. Meneghini,et al. Conduction properties and threshold voltage instability in β-Ga2O3 MOSFETs , 2022, OPTO.
[5] S. Decoutere,et al. Influence of Drain and Gate Potential on Gate Failure in Semi-Vertical GaN-on-Si Trench MOSFETs , 2022, IEEE International Reliability Physics Symposium.
[6] G. Verzellesi,et al. GaN-based power devices: Physics, reliability, and perspectives , 2021, Journal of Applied Physics.
[7] G. Meneghesso,et al. Review on the degradation of GaN-based lateral power transistors , 2021, e-Prime.
[8] G. Meneghesso,et al. Non-monotonic threshold voltage variation in 4H-SiC metal–oxide–semiconductor field-effect transistor: Investigation and modeling , 2021, Journal of Applied Physics.
[9] H. Amano,et al. Vertical GaN p+-n junction diode with ideal avalanche capability grown by halide vapor phase epitaxy , 2021, Applied Physics Letters.
[10] G. Meneghesso,et al. Positive and negative charge trapping GaN HEMTs: Interplay between thermal emission and transport-limited processes , 2021, Microelectronics Reliability.
[11] M. Meneghini,et al. A Physics-Based Approach to Model Hot-Electron Trapping Kinetics in p-GaN HEMTs , 2021, IEEE Electron Device Letters.
[12] S. Decoutere,et al. Challenges and Perspectives for Vertical GaN-on-Si Trench MOS Reliability: From Leakage Current Analysis to Gate Stack Optimization , 2021, Materials.
[13] J. Liu,et al. 1.2 kV Vertical GaN Fin JFETs with Robust Avalanche and Fast Switching Capabilities , 2020, 2020 IEEE International Electron Devices Meeting (IEDM).
[14] A. Waag,et al. Highly stable threshold voltage in GaN nanowire FETs: The advantages of p-GaN channel/Al2O3 gate insulator , 2020 .
[15] D. Ji,et al. Vertical GaN Power Devices , 2020, 2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM).
[16] S. Decoutere,et al. Analysis of threshold voltage instabilities in semi-vertical GaN-on-Si FETs , 2020, Applied Physics Express.
[17] Gaudenzio Meneghesso,et al. On trapping mechanisms at oxide-traps in Al2O3/GaN metal-oxide-semiconductor capacitors , 2016 .
[18] C. Eddy,et al. Effect of GaN surface treatment on Al2O3/n-GaN MOS capacitors , 2015 .
[19] G. Meneghesso,et al. High-voltage double-pulsed measurement system for GaN-based power HEMTs , 2014, 2014 IEEE International Reliability Physics Symposium.
[20] U. Mishra,et al. Photoassisted high-frequency capacitance-voltage characterization of the Si3N4/GaN interface , 2009 .
[21] D. Fleetwood. 'Border traps' in MOS devices , 1992 .
[22] D. R. Wolters,et al. Kinetics of charge trapping in dielectrics , 1985 .
[23] Eldad Bahat Treidel,et al. On the Conduction Properties of Vertical GaN n-Channel Trench MISFETs , 2021, IEEE Journal of the Electron Devices Society.