KINETIC MODELING OF THE CHARGING OF NONCONDUCTING WALLS IN A LOW PRESSURE RADIO FREQUENCY INDUCTIVELY COUPLED PLASMA

This article investigates the overall charging of a nonconducting, plane wall (for instance a wafer) in a low pressure inductively coupled plasma. The problem is addressed using a two-dimensional kinetic model for a low pressure inductive discharge. Comparisons to experimental results show good agreement with the charging profiles predicted by the model. It is pointed out that the surface charge profile on a nonconducting wall is determined by the plasma homogeneity and the high energy part of the electron distribution function. An interpretation of the radial profiles of the sheath potential drop and of the surface charge potential in terms of the differential temperature of the electron distribution function in different energy ranges is presented.

[1]  U. Kortshagen,et al.  On the radial distribution and nonambipolarity of charged particle fluxes in a nonmagnetized planar inductively coupled plasma , 1996 .

[2]  Parker,et al.  Comparison of Monte Carlo simulations and nonlocal calculations of the electron distribution function in a positive column plasma. , 1996, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics.

[3]  Uwe R. Kortshagen,et al.  On simplifying approaches to the solution of the Boltzmann equation in spatially inhomogeneous plasmas , 1996 .

[4]  Parker,et al.  Modeling of nonlocal electron kinetics in a low-pressure inductively coupled plasma. , 1996, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics.

[5]  Tsendin,et al.  Experimental investigation and fast two-dimensional self-consistent kinetic modeling of a low-pressure inductively coupled rf discharge. , 1995, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics.

[6]  Busch,et al.  Numerical solution of the spatially inhomogeneous Boltzmann equation and verification of the nonlocal approach for an argon plasma. , 1995, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics.

[7]  U. Kortshagen,et al.  FAST TWO-DIMENSIONAL SELF-CONSISTENT KINETIC MODELING OF LOW-PRESSURE INDUCTIVELY COUPLED RF DISCHARGES , 1994 .

[8]  Kortshagen.  Experimental evidence on the nonlocality of the electron distribution function. , 1994, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics.

[9]  V. Godyak,et al.  Paradoxical spatial distribution of the electron temperature in a low pressure rf discharge , 1993 .

[10]  Robert J. Hoekstra,et al.  Two‐dimensional hybrid model of inductively coupled plasma sources for etching , 1993 .

[11]  K. Riemann,et al.  The Bohm criterion and sheath formation , 1991 .

[12]  K. Wiesemann.  Der Einfluß einer Blende auf die Verteilungsfunktion der Elektronen in einem Gasentladungsplasma. II Die Messung der Verteilungsfunktion der Elektronen in der Umgebung einer Blende , 1969 .

[13]  I. Bernstein,et al.  Electron Energy Distributions in Stationary Discharges , 1954 .

[14]  S. Brown,et al.  High-frequency gas-discharge breakdown in helium , 1949 .