Fabrication of solar cells utilizing neutralized ion beam sputtering

Using neutralized ion beam sputtering, large area, high efficiency indium tin oxide (ITO)/single and polycrystalline semiconductor-insulator-semiconductor (SIS) silicon solar cells have been fabricated. The principal fabrication steps are ion milling of the silicon surface using an argon-hydrogen-oxygen ion beam, low temperature and low pressure oxidation of the ion milled surface and reactive ion sputter deposition of ITO. Prior to ion milling, the polycrystalline material was chemically polished to remove surface contamination and saw damage. The ion beam sputtering system, device fabrication, operation and photovoltaic characteristics of ITO/silicon SIS solar cells are described. 14 refs.