Influence of the dopant concentration on the photoemission in NEA GaAs photocathodes
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L. J. Gómez | M. T. Montojo | J. Capmany | G. Vergara | J. Capmany | M. Montojo | G. Vergara | L. J. Gomez
[1] H. C. Casey,et al. Concentration dependence of the absorption coefficient for n− and p−type GaAs between 1.3 and 1.6 eV , 1975 .
[2] B. Goldstein. LEED-Auger characterization of GaAs during activation to negative electron affinity by the adsorption of Cs and O , 1975 .
[3] G. Samara. Temperature and pressure dependences of the dielectric constants of semiconductors , 1983 .
[4] I. Lindau,et al. Photoelectron spectroscopic determination of the structure of (Cs,O) activated GaAs (110) surfaces , 1983 .
[5] T. Ishibashi,et al. Minority electron lifetimes in heavily doped p‐type GaAs grown by molecular beam epitaxy , 1991 .
[6] H. Kressel,et al. The Effective Ionization Rate for Hot Carriers in GaAs , 1966 .
[7] Thomas P. Pearsall,et al. The band structure dependence of impact ionization by hot carriers in semiconductors: GaAs , 1978 .
[8] H. Xun,et al. Analysis of photoelectron emission of transmission-mode NEA GaAs photocathodes , 1989 .
[9] H. Schade,et al. Calculated energy distributions of electrons emitted from negative electron affinity GaAs: Cs–O surfaces , 1973 .
[10] M. G. Clark. Interpretation of the surface boundary conditions in the diffusion model for NEA photoemission , 1976 .